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【序号】： 1
【作者】： C. K. Liu and A. P. M. Glassford
【题名】： Kinetics data for diffusion of outgassing species from RTV 560 silicone rubber
【期刊】： J. Vac. Sci. Technol.
【年、卷、期、起止页码】： Volume 15, Issue 5, pp. 1761-1768 (September 1978)
【全文链接】：
http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JVSTAL000015000005001761000001&idtype=cvips&gifs=yes

Permalink: http://dx.doi.org/10.1116/1.569841


Kinetics data for diffusion of outgassing species from RTV 560 silicone rubber
J. Vac. Sci. Technol. Volume 15, Issue 5, pp. 1761-1768 (September 1978)
Issue Date: September 1978
PUBLICATION DATA
ISSN:
0022-5355 (print) 
Publisher:
AVS C. K. Liu and A. P. M. Glassford
Lockheed Palo Alto Research Laboratory, Palo Alto, California 94304

A detailed analytical and experimental study has been made of the outgassing behavior of RTV 560 silicone rubber. Outgassing rate measurements were made by collection of outgassed species on a cooled quartz crystal microbalance (QCM). The four outgassing species which predominate in the temperature range of 285 to 425 K have been separately identified. The initial concentration of these species in the parent material has been determined, while the diffusion coefficients and activation energy for diffusion of the two major species have been deduced from outgassing rate data. It is shown that using these data in a diffusion theory model, the outgassing rates of these major species can be predicted for arbitrary sample thickness, and for any temperature within the range studied.