The Evactron SoftClean System is not a “plasma cleaner” in the usual sense. Traditional plasma cleaning systems sputter etch with energetic ion species, possibly damaging sensitive sample surfaces with heat and ion bombardment. The Evactron SoftClean System chemically etches surfaces using reactive gas radicals produced by the RF generated plasma. It preserves critical sample fine structure. The hydrocarbon contamination is broken down to form CO2, CO and H2O which are easily removed by the system vacuum pump.
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