【序号】:1 【作者】:E. E. Farndon, F. C. Walsh and S. A. Campbell 【题名】: Effect of thiourea, benzotriazole and 4,5-dithiaoctane-1,8-disulphonic acid on the kinetics of copper deposition from dilute acid sulphate solutions 【期刊】:Journal of Applied Electrochemistry 【年、卷、期、起止页码】:1995, 25 (6), pp. 574-583[/url]