主题：【已应助】求外文文獻5篇

【序號】：1

【作者】：Pflug, A.; Siemers, M.; Szyszka, B.

【篇名】：Design tools and simulations for plasma processing in large area coaters

【期刊】：SVC - 52nd Annual Technical Conference Proceedings     

【全文連接】：http://www.knovel.com/web/portal/browse/display?_EXT_KNOVEL_DISPLAY_bookid=2796
                            (在Large Area Coating 的68篇)

【序號】：2

【作者】：

【篇名】：Magnetron Configuration to Enhance Deposition Rate in High Power Impulse Magnetron Sputtering

【期刊】：SVC - 52nd Annual Technical Conference Proceedings     

【全文連接】：http://www.knovel.com/web/portal/browse/display?_EXT_KNOVEL_DISPLAY_bookid=2796
                          (在Hot Topic Session on High Power Impulse Magnetron Sputtering (HIPIMS) 的49篇)

【序號】：3

【作者】：De Gryse, R. Depla, D. Haemers, J.

【篇名】：Poisoning and Depoisoning in Reactive Sputtering with Rotatable Magnetrons

【期刊】：SVC - 50th Annual Technical Conference Proceedings     

【全文連接】：http://www.knovel.com/web/portal/browse/display?_EXT_KNOVEL_DISPLAY_bookid=2009
                          (在Process Control & Instrumentation 的100篇)

【序號】：4

【作者】：M. Rahamathunnisa, G. Ram Prasad, M. Tanttari, T. Kääriäinen, D. C. Cameron

【篇名】：The Effect of DC Pulse Frequency and Pulse-off Time on the Structure and Mechanical Properties of Chromium Nitride Deposited by Pulsed DC Reactive Magnetron Sputter Deposition

【期刊】：SVC - 50th Annual Technical Conference Proceedings     

【全文連接】：http://www.knovel.com/web/portal/browse/display?_EXT_KNOVEL_DISPLAY_bookid=2009                         
                            (在Plasma Processing 的81篇)

【序號】：5

【作者】：A.K. Mishra

【篇名】：Magnetic Field Effect on Pre-Sheath Dynamics in a High Power Impulse Magnetron Sputtering (HiPIMS) Discharge

【期刊】：SVC - 53rd Annual Technical Conference Proceedings     

【全文連接】：http://www.knovel.com/web/portal/browse/display?_EXT_KNOVEL_DISPLAY_bookid=3458
                          (在High Power Impulse Magnetron Sputtering (HIPIMS) 的32篇)