【序号】：1
【作者】：Y. Suh, W. Chen, S. Maeng, S. Gu, R.A. Levy, H. Thridandam
【题名】： Synthesis and characterization of plasma assisted chemically vapor deposited tantalum
【期刊】：Thin Solid Films
【年、卷、期、起止页码】：Volume 518, Issue 19, 30 July 2010, Pages 5452-5456
【全文链接】：http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TW0-4YVJ3SY-G&_user=10&_coverDate=07%2F30%2F2010&_alid=1602634433&_rdoc=1&_fmt=high&_orig=search&_origin=search&_zone=rslt_list_item&_cdi=5548&_sort=r&_st=13&_docanchor=&_ct=1145&_acct=C000050221&_version=1&_urlVersion=0&_userid=10&md5=757f0c03447eeec402395209ddfe60c1&searchtype=

【序号】：2
【作者】：
【题名】： 2476. Reactions under low pressure of chlorine and gaseous tantalum chloride on the tantalum surface and an application to vapour deposition
【期刊】：Vacuum
【年、卷、期、起止页码】：Volume 27, Issue 2, 1977, Page 78
【全文链接】：http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TW4-4H9PHHH-27&_user=10&_coverDate=12%2F31%2F1977&_alid=1602634433&_rdoc=2&_fmt=high&_orig=search&_origin=search&_zone=rslt_list_item&_cdi=5552&_sort=r&_st=13&_docanchor=&_ct=1145&_acct=C000050221&_version=1&_urlVersion=0&_userid=10&md5=272c74e5f6eba15859c92018438fcdbc&searchtype=a

【序号】：3
【作者】：Fran ？ois Cardarelli, Pierre Taxil, André Savall
【题名】： Tantalum protective thin coating techniques for the Chemical Process Industry: Molten salts electrocoating as a new al-ternative
【期刊】：International Journal of Refractory Metals and Hard Materials
【年、卷、期、起止页码】：Volume 14, Issues 5-6, 1996, Pages 365-38-
【全文链接】：http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TY1-3VT9G8F-8&_user=10&_coverDate=12%2F31%2F1996&_alid=1602634433&_rdoc=3&_fmt=high&_orig=search&_origin=search&_zone=rslt_list_item&_cdi=5605&_sort=r&_st=13&_docanchor=&_ct=1145&_acct=C000050221&_version=1&_urlVersion=0&_userid=10&md5=139d8631b62b6c08ce6ef884a166e7cc&searchtype=a

【序号】：4
【作者】：Yuzuru Ogura, Chikako Kobayashi, Yoshiyuki Ooba, Naoki Yahata, Hitoshi Sakamoto
【题名】： Low temperature deposition of metal films by metal chloride reduction chemical vapor deposition
【期刊】：Surface and Coatings Technology
【年、卷、期、起止页码】：Volume 200, Issue 10, 24 February 2006, Pages 3347-3350
【全文链接】：http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TVV-4GV8STM-5&_user=10&_coverDate=02%2F24%2F2006&_alid=1602634433&_rdoc=5&_fmt=high&_orig=search&_origin=search&_zone=rslt_list_item&_cdi=5544&_sort=r&_st=13&_docanchor=&_ct=1145&_acct=C000050221&_version=1&_urlVersion=0&_userid=10&md5=9d4044fbaba24dccfeb43bf28b763d50&searchtype=a

【序号】：5
【作者】：
【题名】： A high rate of chemical vapor deposition of tantalum pentoxide film initiated by photoexcitation
【期刊】：Applied Surface Science
【年、卷、期、起止页码】：Volumes 79-80, 2 May 1994, Pages 220-226
【全文链接】：http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6THY-46YKRSF-6W&_user=10&_coverDate=05%2F02%2F1994&_alid=1602634433&_rdoc=6&_fmt=high&_orig=search&_origin=search&_zone=rslt_list_item&_cdi=5295&_sort=r&_st=13&_docanchor=&_ct=1145&_acct=C000050221&_version=1&_urlVersion=0&_userid=10&md5=20f1302b1d7322315fc3ea9c8a1a63db&searchtype=a

推荐答案：知而後行回复于2011/01/11

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