主题：【已应助】求外文文獻幾篇~謝謝

【序號】：1

【作者】：C. H. Shon, J. K. Lee.

【篇名】：Modeling of magnetron sputtering plasmas

【期刊】： Applied Surface Science Volume 192, Issues 1-4, 30 May 2002, Pages 258-269

【全文連接】：http://www.sciencedirect.com/science/article/pii/S0169433202000302

【序號】：2

【作者】：U.H. Kwon, S.H. Choi, Y.H. Park and W.J. Lee

【篇名】：Multi-scale simulation of plasma generation and film deposition in a circular type DC magnetron sputtering system

【期刊】： Thin Solid Films，Volume 475, Issues 1-2, 22 March 2005, Pages 17-23

【全文連接】：http://www.mendeley.com/research/multiscale-simulation-plasma-generation-film-deposition-circular-type-dc-magnetron-sputtering-system/

【序號】：3

【作者】：Zhou, Chuandong;  Stoltz, Peter H.;

【篇名】：Numerical simulation of a magnetron plasma sputtering system using VORPAL

【期刊】： Plasma Science, 2010 Abstracts IEEE International Conference on Issue Date: 20-24 June 2010

【全文連接】：http://ieeexplore.ieee.org/xpl/freeabs_all.jsp?arnumber=5534033

【序號】：4

【作者】：H. Kupfer and F. Richter

【篇名】：Investigation of plasma characteristics in an unbalanced magnetron sputtering system

【期刊】： PLASMA PHYSICS REPORTSVolume 35, Number 5, 399-408,

【全文連接】：http://www.springerlink.com/content/23u17364185551q0/

【序號】：5

【作者】：Y. Kusumoto , , K. Iwata,

【篇名】：Numerical study of the characteristics of erosion in magnetron sputtering

【期刊】： Vacuum Volume 74, Issues 3-4, 7 June 2004, Pages 359-365

【全文連接】：http://www.sciencedirect.com/science/article/pii/S0042207X0400051X