【作者】:
G. Danga,
*,
z,
H. Chob,
K. P. Ipa,
S. J. Peartonb,
**,
S. N. G. Chuc,
**,
J. Lopatac,
W. S. Hobsonc,
L. M. F. Chirovskyc and
F. Rena,
**【题名】: Comparison of Dry and Wet Etch Processes for Patterning SiO
2 / TiO
2 Distributed Bragg Reflectors for Vertical-Cavity Surface-Emitting Lasers
【期刊】:
J. Electrochem. Soc.
【年、卷、期、起止页码】:
2001 volume 148, issue 2, G25-G28
【全文链接】:
http://jes.ecsdl.org/content/148/2/G25