【序号】:1
【作者】:Youichi Nakayama
1, Takayuki Takahagi
1, Fusami Soeda
1, Kenji Hatada
2, Shoji Nagaoka
3, Jirou Suzuki
3, Akira Ishitani
4【题名】:XPS analysis of NH
3 plasma-treated polystyrene films utilizing gas phase chemical modification
【期刊】:Journal of Polymer Science Part A: Polymer Chemistry
【年、卷、期、起止页码】:
Volume 26, Issue 2,pages 559–572, February 1988
【全文链接】:
http://onlinelibrary.wiley.com/doi/10.1002/pola.1988.080260219/abstract