【序号】:1
【作者】:Sun Jin Yun
【题名】:Dependence of atomic layer-deposited Al2O3 films characteristics on growth temperature and Al precursors of Al(CH3)3 and AlCl3
【期刊】:Journal of Vacuum Science & Technology A
【年、卷、期、起止页码】:Volume 15, Issue 6,page 2993 (1997)
【全文链接】:
http://avspublications.org/jvsta/resource/1/jvtad6/v15/i6/p2993_s1?isAuthorized=no