【序號】:4 【作者】:M Horkel, K Van Aeken, C Eisenmenger-Sittner, D Depla, S Mahieu and W P Leroy 【篇名】:Experimental determination and simulation of the angular distribution of the metal flux during magnetron sputter deposition 【期刊】: Journal of Physics D: Applied Physics 【全文連接】:http://iopscience.iop.org/0022-3727/43/7/075302