主题：【已应助】求文獻4篇

【序號】：1

【作者】：Shon, C.H.; Park, J.S. ;  Lee, J.K.

【篇名】：Simulation of magnetron sputter with three-dimensional magnetic field

【期刊】：Plasma Science, 1999. ICOPS '99.

【全文連接】：http://ieeexplore.ieee.org/xpl/login.jsp?tp=&arnumber=829565&url=http%3A%2F%2Fieeexplore.ieee.org%2Fxpls%2Fabs_all.jsp%3Farnumber%3D829565

【序號】：2

【作者】：Shuji Kondo and Kenichi Nanbu

【篇名】：Axisymmetrical particle-in-cell/Monte Carlo simulation of narrow gap planar magnetron plasmas. I. Direct current-driven discharge

【期刊】：Journal of Vacuum Science & Technology

【全文連接】：http://avspublications.org/jvsta/resource/1/jvtad6/v19/i3/p830_s1?isAuthorized=no

【序號】：3

【作者】：T. Yagisawa and T. Makabe

【篇名】：Modeling of dc magnetron plasma for sputtering: Transport of sputtered copper atoms

【期刊】： Journal of Vacuum Science & Technology

【全文連接】：http://avspublications.org/jvsta/resource/1/jvtad6/v24/i4/p908_s1?isAuthorized=no

【序號】：4

【作者】：S. Dujko, R. D. White, Z. Lj. Petrović, and R. E. Robson 

【篇名】：Benchmark calculations of nonconservative charged-particle swarms in dc electric and magnetic fields crossed at arbitrary angles

【期刊】：  Phys. Rev.

【全文連接】：http://pre.aps.org/abstract/PRE/v81/i4/e046403