Helios NanoLab™ 50 系列双束(DualBeam) 仪器结合了最先进的扫描电子显微镜 (SEM) 和具有创新气体化学方法、探测器和操纵器的聚焦离子束 (FIB) 技术
Electron beam resolution @ optimum WD
- 0.8 nm at 30 kV (STEM)
- 0.8 nm at 15 kV
- 0.8 nm at 2 kV
- 0.9 nm at 1 kV SAT
- 1.5 nm at 200 V
Electron beam resolution @ coincident point
- 0.8 nm at 15 kV SAT
- 0.9 nm at 5 kV
拥有世界最高分辨率 (XHR) 的扫描电子显微镜,即Magellan XHR 扫描电子显微镜,这是一部可以在不同角度和在1-30kv范围内用小于一纳米分辨率进行三维表面成像的仪器
Electron beam resolution
• (site survey required to determine attainable resolution)
• Resolution @ optimum WD
–– 0.8 nm at 15 kV
–– 0.8 nm at 2 kV
–– 0.9 nm at 1 kV
–– 1.5 nm at 200 V
• Resolution @ coincident point
–– 0.8 nm at 15 kV
–– 0.9 nm at 5 kV
–– 1.2 nm at 1 kV