【序号】: 1 【作者】: Harold R. Kaufman and Raymond S. Robinson 【题名】: Broad-beam ion source technology and applications 【期刊】: Microelectronics Reliability 【年、卷、期、起止页码】: Vacuum39(11/12), 1175 (1989) 【全文链接】:http://www.sciencedirect.com/science/article/pii/0026271490906649