【序号】:1
【作者】:Woo-Hee Kim,1 Han-Bo-Ram Lee,2 Kwang Heo,3 Young Kuk Lee,5 Taek-Mo Chung,5 Chang Gyoun Kim,5 Seunghun Hong,3,4 Jong Heo,1 and Hyungjun Kim2
【题名】:Atomic Layer Deposition of Ni Thin Films and Application to Area-Selective Deposition【期刊】:J. Electrochem. Soc.,
【年、卷、期、起止页码】:Volume 158, Issue 1, pp. D1-D5 (2011)【全文链接】http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JESOAN0001580000010000D1000001&idtype=cvips&gifs=yes&ref=no【序号】:2
【作者】:Jani Hämäläinen,1 Jani Holopainen,1 Frans Munnik,2 Timo Hatanpää,1 Mikko Heikkilä,1 Mikko Ritala,1 and Markku Leskelä1
【题名】:Lithium Phosphate Thin Films Grown by Atomic Layer Deposition【期刊】:J. Electrochem. Soc.,
【年、卷、期、起止页码】:Volume 159, Issue 3, pp. A259-A263 (2012)【全文链接】http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JESOAN00015900000300A259000001&idtype=cvips&gifs=yes&ref=no【序号】:3
【作者】:Titta Aaltonen, Mikko Ritala, and Markku Leskelä
【题名】:ALD of Rhodium Thin Films from Rh(acac)3 and Oxygen【期刊】:Electrochem. Solid-State Lett.,
【年、卷、期、起止页码】:Volume 8, Issue 8, pp. C99-C101 (2005)
【全文链接】http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=ESLEF6000008000008000C99000001&idtype=cvips&gifs=yes&ref=no【序号】:4
【作者】:Vladimir A. Sivakov Dr.1,2, Katja Höflich1,2, Michael Becker Dr.1,2, Andreas Berger Dr.1,2, Thomas Stelzner Dr.2, Kai-Erik Elers Dr.3, Viljami Pore Dr.4, Mikko Ritala Prof. Dr.4, Silke H. Christiansen Dr【题名】:Silver Coated Platinum Core–Shell Nanostructures on Etched Si Nanowires: Atomic Layer Deposition (ALD) Processing and Application in SERS【期刊】:ChemPhysChem
【年、卷、期、起止页码】:Volume 11, Issue 9, pages 1995–2000, June 21, 2010【全文链接】http://onlinelibrary.wiley.com/doi/10.1002/cphc.201000115/full【序号】:5【作者】:Marianna Kemell1, Emma Härkönen, Viljami Pore, Mikko Ritala and Markku Leskelä【题名】:Ta2O5- and TiO2-based nanostructures made by atomic layer deposition 【期刊】:Nanotechnology 【年、卷、期、起止页码】:Volume 21 Number 3【全文链接】http://iopscience.iop.org/0957-4484/21/3/035301