主题：【已应助】求文獻5篇

【序號】：1

【作者】：Tomáš Kozák 

【篇名】：Effect of the target power density on high-power impulse magnetron sputtering of copper

【期刊】：Plasma Sources Science and Technology

【全文連接】：http://iopscience.iop.org/0963-0252/21/2/025012;jsessionid=D72EA462BAEDE60233EF8007CEA5C4E4.c3

【序號】：2

【作者】：J W Bradley

【篇名】：Study of the plasma pre-sheath in magnetron discharges dominated by Bohm diffusion of electrons

【期刊】：Plasma Sources Science and Technology

【全文連接】：http://iopscience.iop.org/0963-0252/7/4/014;jsessionid=290865F637619C46FB4EE57696B08759.c1

【序號】：3

【作者】：J.W Bradley, , R.D Arnell, D.G Armour 

【篇名】：Measurement and modelling of the bulk plasma in magnetron sputtering sources

【期刊】： Surface and Coatings Technology

【全文連接】：http://www.sciencedirect.com/science/article/pii/S0257897297002144

【序號】：4

【作者】：J W Bradley and T Welzel

【篇名】：Physics and phenomena in pulsed magnetrons: an overview

【期刊】：  Journal of Physics D: Applied Physics

【全文連接】：http://iopscience.iop.org/0022-3727/42/9/093001

【序號】：5

【作者】：S. K. Karkari, A. R. Ellingboe, C. Gaman, I. Swindells, and J. W. Bradley

【篇名】：Electron density modulation in an asymmetric bipolar pulsed dc magnetron discharge

【期刊】： Journal of Applied Physics

【全文連接】：http://jap.aip.org/resource/1/japiau/v102/i6/p063308_s1?isAuthorized=no