文章内容:用动电位极化和EIS电化学阻抗评价钛合金微弧氧化膜的性能。
审稿人的第一个问题:
Bc values appear to be too high for genuine Tafel behaviour. The fitting method used in Tafel analysis must be discussed in details. There appear to be no Tafel distinct region in anodic direction; hence a limiting current must be used to evaluate icorr.
请问:“limiting current” 的意义是什么,该怎样计算?当时用Cview进行的计算,自动tafel分析不能进行,跳出的提示是:“5mV of data required on each sides of Ecorr”。于是,我分别对anodic 和cathodic进行了独立的分析。得出Ac和Bc,呵呵,结果就是审稿人说Bc有问题……
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审稿人的第二个问题:
For, EIS fitting, complex plot must be provided.
他所说的complex plot 是不是 complex plane plot (复平面图)啊?也就是Nyquist图吧?