【序号】:1
【作者】:Taishi, T; Huang, XM; Kubota, M, et al.
【题名】:Heavily boron-doped silicon single crystal growth: Boron segregation
【期刊】:JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
【年、卷、期、起止页码】:卷: 38 期: 3A 页: L223-L225 出版年:MAR 1 1999
【全文链接】:http://jjap.jsap.jp/link?JJAP/38/L223/
【序号】:2
【作者】:Hoshikawa, K; Huang, XM; Taishi, T, et al.
【题名】:Dislocation-free Czochralski silicon crystal growth without the dislocation-elimination-necking process 【期刊】:JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
【年、卷、期、起止页码】:卷: 38 期:12A 页:L1369 -L1371 出版年: DEC 1.1999
【全文链接】:http://jjap.jsap.jp/link?JJAP/38/L1369/【序号】:3
【作者】: Yonenaga, I; Taishi, T; Huang, X, et al.
【题名】:Dynamic characteristics of dislocations in highly boron-doped silicon
【期刊】: JOURNAL OF APPLIED PHYSICS
【年、卷、期、起止页码】:卷: 89 期:10 页: 5788-5790 出版年: MAR 15 2001
【全文链接】:http://jap.aip.org/resource/1/japiau/v89/i10/p5788_s1?isAuthorized=no