Rong Fang, Xia Guo, Wen Jing Jiang, <"/>
【作者】:<A href="" R')" >Rong Fang, <A href="" X')" >Xia Guo, <A href="" W')" >Wen Jing Jiang, <A href="" Y')" >Yu Han Guo, <A href="" Y')" >Yuan Qin, <A href="" G')" >Guang Di Shen, and <A href="" J')" >Jin Ru Han .
【题名】:A Study on the Cl2/C2H4/Ar Plasma Etching of ITO Using Inductively Coupled Plasma
【期刊】:Asia Communications and Photonics Conference and Exhibition (ACP)
【年、卷、期、起止页码】:November 2, 2009,Page ThG1
【全文链接】:http://www.opticsinfobase.org/abstract.cfm?uri=ACP-2009-ThG1